Custom Oxide MBE System
We have constructed a custom oxide molecular beam epitaxy system capable of growing state-of-the-art oxide thin films and heterostructures. Our custom MBE system operates at a base pressure of 2 x 10-10 Torr, and is equipped with thermal effusion cells and an e-beam source which enable a variety of metals to be evaporated. Oxygen is supplied through an RF plasma source and the system is also equipped with a reflection high energy electron diffraction (RHEED) system for real-time characterization of films during growth, as well as a mass spectrometer.
We characterize the structural and electrical properties of the thin films and heterostructures using a variety of facilities located on campus.
Materials Characterization & Device Fabrication Facilities
To elucidate structural and electronic properties, we characterize our oxide thin-films and heterostructures using a variety of techniques, including electrical transport measurements, x-ray photoemission spectroscopy and x-ray diffraction. The characterization facilities are at shared facilities on campus such as the Characterization Center for Materials and Biology (http://ccmb.uta.edu/).
In addition, we also use UT Arlington’s Nanofab (http://www.uta.edu/nano/) to make test devices based on our oxide thin films and heterostructures. The Nanofab is a 10,000 sq. ft. class 100 cleanroom facility equipped with state-of-the-art lithography, deposition and metrology equipment.
